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Equipment
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- Nd:YVO4 laser Lumera Rapid/ wavelength: 1064 nm, 532 nm, 355 nm; Average power 4 W at 500 kHz @1064 nm; 8-11 ps pulse duration; 500 kHz maximum repetition rate
- Nd:YAG laser EKSPLA NL301HT/ wavelength: 1064 nm, 532 nm, 355 nm, 266 nm; 90 – 600 mJ/pulse; 5 ns pulse duration; 10 Hz maximum repetition rate
- He-Cd Laser Kimmon IK series/ wavelength: 325 nm, 10 mW, transverse mode TEM00
- 2 Pulsed laser deposition systems
- Possibility of control of thin film composition
- Substrate heating system 850 °C in oxygen with Heat Wave Labs controller
- Computer-controlled multi-target movement system with ± 0.1 μm resolution
- 10-6 Torr base pressure
- Upstream/downstream pressure and gas flow controllers mks
- High precision computer-controlled micro- and nano-patterning system; allows 2-D and 3-D control of process
- Differential mobility analyzer 3 nm – 1100 nm
- Profile and roughness meter, Surfcom 130 A, 50 mm measuring range, 0.3 µm/50 mm straightness accurarcy
- Network/Spectrum/Impedance Analyzer- Agilent 4396B
- Timer/Counter CNT-90 + Soft - 0-300 MHz
- Walter Uhl TM2 portable measuring microscope for measuring flat or cylindrical surfaces with 3 digital measuring axes (x/y/z) with 1 µm resolution on all axes. Allows precise measurement on z-axis (depth). Includes color camera and software for image capture and measurements
- Zoom stereo microscope, Optika, SZM LED2
- Tube furnace, Barnstead F21100, 100-1200 0C
- Microcentrifuge, Sigma, 20-14800 rpm
- Laboratory heatter, Heidolph MR 3002S, 0-300 0C, 100-1250 rpm
- Analytical balance Adam AAA 100N 100 g max
- Heating magnetic stirrer with thermoregulator, Velp, Arec X, 287044 model, RT-550 0C, 1500 rpm
- Ultrasound disaggregator, Abl@E-Jasco, VC-130 PB, 10-250 ml
- Sheet resistance meter, Bridge Technology, SRM-232-1000, 0-1000 ohm/square
- Electrometer 2400 Keithley 5 µV-210 V; 50 pA-1.05 A; 100 µΩ-211 MΩ; maximum power source 22 W
- Solar simulator LS0106 LOT-Oriel GmbH 100 mW/cm2 1.5 AM filter
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